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Silicium epitaxy, epi, epitaxy, epitaksial henviser til væksten af et lag af krystal med den samme krystalretning og forskellige krystallykkelser på et enkelt krystallinsk siliciumsubstrat. Epitaksial vækstteknologi er påkrævet til fremstilling af halvlederdiskrete komponenter og integrerede kredsløb, fordi urenhederne indeholdt i halvledere inkluderer N-type og P-type. Gennem en kombination af forskellige typer udviser halvlederenheder en række funktioner.
Silicium epitaxy vækstmetode kan opdeles i gasfase epitaxy, flydende fase epitaxy (LPE), solid fase epitaxy, kemisk dampaflejringsvækstmetode er vidt brugt i verden til at imødekomme gitterintegriteten.
Typisk siliciumpitaksialudstyr er repræsenteret af det italienske selskab LPE, der har pandekage -epitaksial hy pnotisk tor, tønde type hy pnotisk tor, halvleder hy pnotic, wafer bærer og så videre. Det skematiske diagram over tøndeformet epitaksial hypelectorreaktionskammer er som følger. Vetek Semiconductor kan give tøndeformet wafer-epitaksial hypelector. Kvaliteten af sic coated hy pelector er meget moden. Kvalitet svarende til SGL; På samme tid kan Vetek Semiconductor også tilvejebringe silicium epitaksiale reaktionshulrum kvarts dyse, kvartsskylle, klokkebeholder og andre komplette produkter.
Sic Coated Graphite Barrel Sceptor for EPI
Sic coated tøndefølsomhed
CVD sic coated tøndefølsomhed
LPE hvis Epi -supporter sæt
Sic Coating Monokrystallinsk silicium epitaksial bakke
SIC Coated Support til LPE PE2061S
Grafit roterende support
Veteksemicon silicon epitaxy solutions are your strategic procurement choice for advanced semiconductor wafer processing, particularly in CMOS, power devices, and MEMS applications. As a key process in wafer engineering, silicon epitaxy (Si Epi) involves the precise deposition of a crystalline silicon layer on top of a polished silicon wafer, offering superior control of doping profiles, defect density, and layer thickness.
Veteksemicon provides epitaxy-ready susceptor parts and reactor components used in Epi CVD systems, supporting both atmospheric and reduced pressure processes. Our product lineup includes silicon epitaxy susceptors, carrier rings, and coated wafer holders, optimized for compatibility with tools from Applied Materials, ASM, and Tokyo Electron (TEL).
Silicon epitaxy plays a critical role in producing ultra-thin junctions, strained silicon layers, and high-voltage isolation structures. Our materials and parts are engineered for high-purity, uniform thermal distribution, and anti-contamination performance during n-type and p-type epitaxial growth.
Closely associated terms include epitaxial wafer, in-situ doping, epitaxy-ready SiC coatings, and epi reactor parts, which support the entire upstream and downstream process of silicon-based IC fabrication.
Discover more about Veteksemicon’s silicon epitaxy support solutions by visiting our product detail page or contacting us for technical consultation and part customization.
+86-579-87223657
Wangda Road, Ziyang Street, Wuyi County, Jinhua City, Zhejiang -provinsen, Kina
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